Quartz Frit Rod / Quartz Sintered Glass
Size: D=diameter*L=length
Here is a detailed breakdown of the typical application environments for Quartz Frit Discs (Sintered Glass) across the G00 to G5:
| Grade | Pore Size (Avg.) | Pore Characteristics | Primary Application Environments |
| G00 | 250 – 550 µm | Extra Coarse, Very Open Structure | • Gas Pre-filtration & Buffering: Used at the inlet of gas lines to remove large particulates like dust, rust, or metal flakes. • Support Layer: Serves as a robust base support for finer filters or membranes in multi-stage filtration setups. • Gas Distribution / Sparging: Provides even dispersion of gases in reactors or columns with minimal pressure drop. |
| G0 | 160 – 250 µm | Very Coarse, High Flow Rate | • Rapid Rough Filtration: Initial clarification of viscous liquids or solutions with coarse suspended solids. • Protective Filtration: Shields downstream pumps or sensitive instruments from large debris. • High-Temperature Sample Support: Acts as a permeable bed or support for powder samples in tube furnaces, allowing high gas flow. |
| G1 | 100 – 150 µm | Coarse, Fast Flow | • General Purpose Separation: Efficient filtration of coarse crystals, precipitates (e.g., in soil analysis), or sand. • Boiling Chips / Anti-bumping: Provides nucleation sites for even boiling in chemical distillation. • Coarse Frit for Chromatography Columns:Used as a support bed for larger packing materials. |
| G2 | 40 – 100 µm | Medium-Coarse, Versatile | • Standard Laboratory Filtration: The most common grade for general Büchner funnel filtration of moderate-sized precipitates (e.g., after crystallization). • Gas Scrubbing / Drying: Used in gas wash bottles with drying agents (e.g., silica gel, molecular sieves). • Catalyst Bed Support: In fixed-bed reactors, supports catalyst pellets while allowing reactant flow. |
| G3 | 16 – 40 µm | Medium, Balanced Flow/Clarity | • Fine Precipitate Filtration: For separating fine crystalline products or analytical precipitates (e.g., barium sulfate). • Clarification Filtration: Removing fine hazes or particles from solutions prior to further analysis. • Sintered Disc for Reaction Vessels: Used as a built-in filter in glassware for Schlenk-line or vacuum line operations. |
| G4 | 10 – 16 µm | Fine, Slow Flow | • Fine Particle Retention: Effective for filtering fine powders, diatomaceous earth, or fine microbial cultures. • Aggressive Chemical Filtration: Used with strong acids/bases (except HF) where membrane filters would degrade. • High-Purity Gas Filtration: Removes fine particulates from carrier gases in semiconductor or analytical instrument supply lines. |
| G5 | 4 – 10 µm | Very Fine / Ultra-Fine, Low Flow | • Sterile Gas Filtration / Sparging: For sterile aeration of bioreactors or creating ultra-clean inert atmospheres. • Final Clarification / Polishing: Achieving high-clarity in sensitive optical or electronic-grade chemical solutions. • Advanced Gas Dispersion: Producing very fine, uniform gas bubbles in specialized chemical or materials synthesis processes. |






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