Quartz Frit / Quartz Sintered Glass Custom Fabrication
$10.00
- Type: Quartz Frit / Quartz Sintered Glass Custom Fabrication
- Made of: 99.999%SiO₂
- Feature: strong acid & alkali resistance/1000°C working temp.
- Order Processing Time: scheduled time
- Customization Instruction：this payment link is used to pay for customized quartz frit
- Item NO.: M26236
Quartz Frit / Quartz Sintered Glass Custom Fabrication
Size: D=diameter*T=thickness
Here is a detailed breakdown of the typical application environments for Quartz Frit Discs (Sintered Glass) across the G00 to G5:
| Grade | Pore Size (Avg.) | Pore Characteristics | Primary Application Environments |
| G00 | 250 – 550 µm | Extra Coarse, Very Open Structure | • Gas Pre-filtration & Buffering: Used at the inlet of gas lines to remove large particulates like dust, rust, or metal flakes. • Support Layer: Serves as a robust base support for finer filters or membranes in multi-stage filtration setups. • Gas Distribution / Sparging: Provides even dispersion of gases in reactors or columns with minimal pressure drop. |
| G0 | 160 – 250 µm | Very Coarse, High Flow Rate | • Rapid Rough Filtration: Initial clarification of viscous liquids or solutions with coarse suspended solids. • Protective Filtration: Shields downstream pumps or sensitive instruments from large debris. • High-Temperature Sample Support: Acts as a permeable bed or support for powder samples in tube furnaces, allowing high gas flow. |
| G1 | 100 – 150 µm | Coarse, Fast Flow | • General Purpose Separation: Efficient filtration of coarse crystals, precipitates (e.g., in soil analysis), or sand. • Boiling Chips / Anti-bumping: Provides nucleation sites for even boiling in chemical distillation. • Coarse Frit for Chromatography Columns:Used as a support bed for larger packing materials. |
| G2 | 40 – 100 µm | Medium-Coarse, Versatile | • Standard Laboratory Filtration: The most common grade for general Büchner funnel filtration of moderate-sized precipitates (e.g., after crystallization). • Gas Scrubbing / Drying: Used in gas wash bottles with drying agents (e.g., silica gel, molecular sieves). • Catalyst Bed Support: In fixed-bed reactors, supports catalyst pellets while allowing reactant flow. |
| G3 | 16 – 40 µm | Medium, Balanced Flow/Clarity | • Fine Precipitate Filtration: For separating fine crystalline products or analytical precipitates (e.g., barium sulfate). • Clarification Filtration: Removing fine hazes or particles from solutions prior to further analysis. • Sintered Disc for Reaction Vessels: Used as a built-in filter in glassware for Schlenk-line or vacuum line operations. |
| G4 | 10 – 16 µm | Fine, Slow Flow | • Fine Particle Retention: Effective for filtering fine powders, diatomaceous earth, or fine microbial cultures. • Aggressive Chemical Filtration: Used with strong acids/bases (except HF) where membrane filters would degrade. • High-Purity Gas Filtration: Removes fine particulates from carrier gases in semiconductor or analytical instrument supply lines. |
| G5 | 4 – 10 µm | Very Fine / Ultra-Fine, Low Flow | • Sterile Gas Filtration / Sparging: For sterile aeration of bioreactors or creating ultra-clean inert atmospheres. • Final Clarification / Polishing: Achieving high-clarity in sensitive optical or electronic-grade chemical solutions. • Advanced Gas Dispersion: Producing very fine, uniform gas bubbles in specialized chemical or materials synthesis processes. |
Quartz Glass Features–
Physical Properties:
It has an extremely low coefficient of thermal expansion (~5.5 x 10⁻⁷/K), granting exceptional resistance to thermal shock. Its softening point is above 1650°C, and it can be used continuously at 1100°C. Quartz glass is highly transparent across a broad spectrum, from deep ultraviolet (UV) to near-infrared (IR). It possesses high dielectric strength and excellent electrical insulation properties even at elevated temperatures.
Chemical Properties:
The material is chemically inert to most substances. It has outstanding resistance to weathering and demonstrates low reactivity with acids (except hydrofluoric and hot phosphoric acid) and molten metals. Its high purity results in minimal contamination in sensitive processes. However, it is susceptible to devitrification (crystallization) at prolonged high temperatures, which can degrade its thermal and optical performance.
| Size | payment link for customization |
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